Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

PDF) Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

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PDF) Rapid Reversible Degradation of Silicon Thin Films by a Treatment in Water

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

PDF) Stability of SiNx Prepared by Plasma-Enhanced Chemical Vapor Deposition at Low Temperature

Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Table 4 from Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications

PDF) Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Strength of chemical bonds occurring during plasma deposition of SiO x

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma - ScienceDirect

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