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Liner Sweep Voltammetry Electroplating Method to Synthesize Large Monocrystalline Cu Cones for Interconnection

$ 24.00

4.6 (491) In stock

Huiqin LING, Shanghai Jiao Tong University, Shanghai, SJTU, State Key Laboratory of Metal Matrix Composites

Conductive diamond: synthesis, properties, and electrochemical applications - Chemical Society Reviews (RSC Publishing) DOI:10.1039/C7CS00757D

Structural Accelerating Effect of Chloride on Copper Electrodeposition

Liner Sweep Voltammetry Electroplating Method to Synthesize Large Monocrystalline Cu Cones for Interconnection

PDF] Effect of Organic Additives on Formation and Growth Behavior of Micro-Void in Electroplating Copper Films

Impact of Nanosize on Supercapacitance: Study of 1D Nanorods and 2D Thin-Films of Nickel Oxide

Materials, Free Full-Text

Liner sweep voltammetry curve (a) and its partial enlarged drawing (b)

Frontiers of Cu Electrodeposition and Electroless Plating for On-chip Interconnects

A review of helical nanostructures: Growth theories, synthesis strategies and properties

Nanomaterials, Free Full-Text

Mechanical properties of Cu pillar flip chip package

Effect of Cu grain size on the voiding propensity at the interface of SnAgCu/Cu solder joints

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